Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 162-166

  Gelamo, R V ^a   Trasferetti, B C ^a   Durrant, S F ^b   Davanzo, C U ^a   Rouxinol, F P ^a   Gadioli, G Z ^a   Bica de Moraes, M A ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

Chemical structure; FTIR; Ion irradiation; Plasma polymerization; Si based polymer film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRRADIATION; PLASMA DENSITY; PLASMA POLYMERIZATION; STRUCTURE (COMPOSITION);

ION IRRADIATION; POLARIZED MODE; POLYCARBOSILANE; SI-BASED POLYMER FILM;

THIN FILMS;

EID: 33746054531     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.03.105     Document Type: Article

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