Influence of Ar+ ion irradiation on the properties of plasma polymerized acetylene films

Surface and Coatings Technology

Volumn 127, Issue 1, 2000, Pages 93-98

  Rangel, Elidiane C ^a   Da Cruz, Nilson C ^a   De Moraes, Mario A B ^a   Lepienski, Carlos M ^b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

Electrical resistivity; Etching; Hardness; Ion irradiation; Optical gap; Polymer

Indexed keywords

AMORPHOUS FILMS; CROSS CONNECTIONS (WATER DISTRIBUTION); ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; HARDNESS TESTING; ION BOMBARDMENT; OPTICAL PROPERTIES; PLASMA ETCHING; PLASMA POLYMERIZATION; POLYACETYLENES; RADIATION EFFECTS; ULTRAVIOLET SPECTROSCOPY;

OPTICAL GAP;

PLASTIC FILMS;

EID: 0033741128     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00550-8     Document Type: Article

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