Quantum effects in ion implanted devices

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 221-225

  Jamieson, D N ^a   Chan, V ^b   Hudson, F E ^b   Andresen, S E ^b   Yang, C ^a   Hopf, T ^a   Hearne, S M ^a   Pakes, C I ^a   Prawer, S ^a   Gauja, E ^b   Dzurak, A S ^b   Clark, R G ^b  

^a UNIVERSITY OF MELBOURNE   (Australia)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

Charge transport; Ion beam induced charge; Ion beam lithography; Quantum computation; Quantum dots

Indexed keywords

CHARGE TRANSFER; ELECTRONS; ION BEAM LITHOGRAPHY; ION IMPLANTATION; PHOTONS; QUANTUM THEORY;

CHARGE COLLECTION EFFICIENCY; ION BEAM INDUCED CHARGE (IBIC); QUANTUM COMPUTATION;

NANOSTRUCTURED MATERIALS;

EID: 33745956825     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.04.002     Document Type: Article

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