Structure and electrical properties of highly (100)-oriented Ba(Zr 0.05Ti0.95)O3 films prepared by chemical solution deposition

Advanced Materials Research

Volumn 11-12, Issue , 2006, Pages 101-104

  Guo, Yiping ^a   Suzuki, Kazuyuki ^a   Nishizawa, Kaori ^a   Miki, Takeshi ^a   Kato, Kazumi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ba(Zr,Ti)O3; Chemical solution deposition; Electrical properties; Films

Indexed keywords

COERCIVE FORCE; ELECTRIC PROPERTIES; PERMITTIVITY; POLARIZATION; REMANENCE; THIN FILMS; TITANIUM COMPOUNDS; ZIRCONIUM;

BA(ZR,TI)O3; CHEMICAL SOLUTION DEPOSITION; COERCIVE FIELD; REMANENT POLARIZATION;

BARIUM COMPOUNDS;

EID: 33745935033     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (9)

1. P. Muralt: J. Micromech. Microeng. Vol. 10 (2000), p. 136.
2. Z. Yu, R. Guo and A.S. Bhalla: Appl. Phys. Lett. Vol. 77 (2000), p. 1535.
3. Y. Guo, K. Suzuki, K. Nishizawa, T. Miki and K. Kato: J. Cryst. Growth. Vol. 284 (2005), p. 190.
4. S. Hoffmann and R. Waser: J. Euro. Ceram. Soc. Vol. 19 (1999), p. 1339.
5. J. Yu, X.J. Meng, J.L. Sun, Z.M. Huang and J.H. Chu: J. Appl. Phys. Vol. 96 (2004), p. 2792.
6. H. Suzuki, Y. Kondo, S. Kaneko and T. Hayashi: Mater. Res. Soc. Symp. Proc. Vol. 596 (2000), p. 241.
7. W. Gong, J. Li, X. Chu, Z. Gui and L. Li: Acta Materialia Vol. 52 (2004), p. 2787.
8. C.R. Cho, W.J. Lee, B.C. Yu and B.W. Kim: J. Appl. Phys. Vol. 86 (1999), p. 2700.
9. H. Huang, X. Yao, M. Wang and X. Wu: J. Cryst. Growth Vol. 263 (2004), p. 406.