Capacity allocation model for photolithography workstation with the constraints of process window and machine dedication

Production Planning and Control

Volumn 17, Issue 7, 2006, Pages 678-688

  Chung, S H ^a   Huang, C Y ^a   Lee, A H I ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

Capacity allocation; Machine dedication; Process window; Wafer fabrication

Indexed keywords

CONSTRAINT THEORY; INTEGER PROGRAMMING; PROCESS CONTROL; PRODUCT DEVELOPMENT; SEMICONDUCTOR DEVICE MODELS; SPECIFICATIONS;

CAPACITY ALLOCATION; MACHINE DEDICATION; PROCESS WINDOWS; WAFER FABRICATION;

PHOTOLITHOGRAPHY;

EID: 33745929420     PISSN: 09537287     EISSN: 13665871     Source Type: Journal    
DOI: 10.1080/09537280600901145     Document Type: Article

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