Effects of N2 and glow discharge on growth behaviours of carbon nanotubes prepared by the hot filament chemical vapour deposition method

Chinese Physics

Volumn 12, Issue 12, 2003, Pages 1459-1465

  Wang, Bi Ben ^a,b   Gu, Chang Zhi ^a   Dou, Yan ^a   Wang, Guo Ju ^b   Li, Hai Jun ^a,b   Zhu, Man Kang ^b  

^a Institute of Engineering Thermo physics   (China)

^b BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Alignment growth; Carbon nanotubes; Glow discharge; Nitric environment

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; GASES; GLOW DISCHARGES; GROWTH KINETICS; NITROGEN; SCANNING ELECTRON MICROSCOPY; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY;

ALIGNMENT GROWTH; GROWTH MECHANISMS; NITRIC ENVIRONMENT; REACTION GASES;

CARBON NANOTUBES;

EID: 17044387658     PISSN: 10091963     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-1963/12/12/021     Document Type: Article

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