A theoretical evaluation of megasonic cleaning for submicron particles

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages 3657-3659

  Olim, Moshe ^a  

^a FSI International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; CLEANING; PARTICLES (PARTICULATE MATTER);

MEGASONIC CLEANING; SUBMICRON PARTICLES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031251481     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838065     Document Type: Article

References (8)

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3. S. Schwatzman, A. Mayer, and W. Kern, RCA Rev., 46, 81 (1985).
4. I. Kashkoush, A. Busnaina, F. Kern, and R. Kunesh, in Proceedings of the Institute of Environmental Science, p. 407 (1990).
5. J. D. Anderson, Jr., Modern Compressible Flow, McGraw-Hill, New York (1982).
6. M. B. Ranade, Aerosol Sci. Technol., 7, 161 (1987).
7. S. Middleman and A. K. Hockberg, Process Engineering Analysis in Semiconductor Device Fabrication, McGraw-Hill, New York (1993).
8. C. L. J. Adkins, P. J. Resnick, P. J. Clews, E. V. Thomas, N. C. Korbe, and S. T. Cannaday, in Microcontamination Conference Proceedings, p. 206, Canon Communications, CA (1994).