Investigating the role of gas cavitation in megasonic nanoparticle removal

MICRO

Volumn 22, Issue 1, 2004, Pages 57-63

  Vereecke, Guy ^a   Parton, Els ^a   Holsteyns, Frank ^a   Xu, Kaidong ^a   Vos, Rita ^a   Mertens, Paul W ^a   Schmidt, Michael O ^b   Bauer, Theresia ^c  

^a IMEC   (Belgium)

^b INFINEON TECHNOLOGIES AG   (Germany)

^c SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; BUBBLES (IN FLUIDS); CAVITATION; CLEANING; COSTS; CRYSTAL DEFECTS; FLOW OF FLUIDS; NANOSTRUCTURED MATERIALS; PROCESS CONTROL; SILICON WAFERS; VACUUM APPLICATIONS;

GAS CAVITATION; HAZE METHOD; MEGASONIC NANOPARTICLE REMOVAL;

INTEGRATED CIRCUITS;

EID: 1042269754     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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2. SL Cohen et al., "Studies of the Relationship between Megasonics Surface Etching and Particle Removal in SC-1 Solutions," in Proceedings of the Materials Research Society Symposium, vol. 386 (Warrendale, PA: Materials Research Society, 1995), 13-19.
3. AS Busnaina and F Dai, "Megasonic Cleaning," Semiconductor International 20, no. 9 (1997): 85-90.
4. M Olim, "A Theoretical Evaluation of Megasonic Cleaning for Submicron Particles," Journal of the Electrochemical Society 144, no. 10 (1997): 3657-3659.
5. K Xu et al., "Relation between Particle Density and Haze on a Wafer: A New Approach to Measuring Nano-Sized Particles," Solid State Phenomena 92 (2003): 161-164.
6. SH Yoo et al., "Particle Removal Efficiency Evaluation at 40 nm Using Haze Particle Standard," Solid State Phenomena 76-77 (2001): 259-262.
7. M Meuris et al., "The IMEC Clean: A New Concept for Particle and Metal Removal on Si Surfaces," Solid State Technology 38, no. 7 (1995): 109-114.