Compositional and structural changes in ZrOxNy films depending on growth condition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 249, Issue 1-2 SPEC. ISS., 2006, Pages 458-461

  Carvalho, P ^a   Fernandes, A C ^a   Rebouta, L ^a   Vaz, F ^a   Cunha, L ^a   Kreissig, U ^b   Barradas, N P ^c,d   Ramos, A R ^c,d   Alves, E ^c,d  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^d CENTRO DE FÍSICA NUCLEAR DA UNIVERSIDADE DE LISBOA   (Portugal)

Author keywords

Decorative films; Ion beams; Nitrides; Oxides; XRD

Indexed keywords

FILM GROWTH; ION BEAMS; MAGNETRON SPUTTERING; NITRIDES; OXIDES; X RAY DIFFRACTION; ZIRCONIUM COMPOUNDS;

DECORATIVE FILMS; ELASTIC RECOIL DETECTION ANALYSIS (ERDA); OXYGEN FRACTION; REACTIVE GAS FLOW;

THIN FILMS;

EID: 33745847816     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.03.031     Document Type: Article

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