Further pursuit of correlation between lens aberration content and imaging performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1394-1403

  Slonaker, Steve ^a  

^a NIKON PRECISION INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; DEGRADATION; IMAGE ANALYSIS; IMAGING TECHNIQUES; INTERFEROMETRY; LENSES; MASKS; OPTICAL CORRELATION; PHASE MEASUREMENT; PHASE SHIFT; SENSITIVITY ANALYSIS;

AERIAL IMAGES;

PHOTOLITHOGRAPHY;

EID: 0035759079     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435678     Document Type: Conference Paper

References (9)

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6. H. Liu, et al, "Lithographic performance improvements by design optimization of alternating phase-shifting mask", SPIE Vol. 3236, 1997.
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8. S.Hirukawa, et al, "New projection optical system for beyond 150nm patterning with KrF and ArF sources", SPIE Vol. 3334, 1998.
9. C. Progler, D. Wheeler, "Optical lens specifications from a user's perspective", SPIE Vol. 3334, 1998.