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Volumn 5040 III, Issue , 2003, Pages 1465-1476

Pupil-fill imperfections and their effect on lithography

Author keywords

CD control; HV bias; Illuminator; Partial coherence; Pupil fill; Pupilgram; Sigma; Uniformity

Indexed keywords

ABERRATIONS; COHERENT LIGHT; CORRELATION METHODS; LENSES; MATHEMATICAL MODELS; SCANNING;

EID: 0141498283     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485444     Document Type: Conference Paper
Times cited : (10)

References (8)
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    • J.P. Kirk and C.J. Progler, "Pupil illumination: in-situ measurement of partial coherence," Optical Microlithography XI, L. Van den Hove, ed., Proceedings of SPIE 3334, p. 281 - 288, SPIE, Santa Clara, 1998.
    • (1998) Proceedings of SPIE , vol.3334 , pp. 281-288
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  • 2
    • 0036416498 scopus 로고    scopus 로고
    • Influence of laser spatial parameters and illuminator pupil-fill performance on the lithographic performance of a scanner
    • Optical Microlithography XV, A. Yen, ed.; SPIE, Santa Clara
    • S.P. Renwick, S.D. Slonaker, I. Lalovic, and K. Ahmed, "Influence of laser spatial parameters and illuminator pupil-fill performance on the lithographic performance of a scanner," Optical Microlithography XV, A. Yen, ed., Proceedings of SPIE 4691, SPIE, Santa Clara, 2002.
    • (2002) Proceedings of SPIE , vol.4691
    • Renwick, S.P.1    Slonaker, S.D.2    Lalovic, I.3    Ahmed, K.4
  • 3
    • 0001686215 scopus 로고    scopus 로고
    • Impact of illuminator pupil-fill on simulated imaging performance
    • Optical Microlithography XIII, C.J. Progler, ed.; SPIE, Santa Clara
    • T.C. Barrett, "Impact of illuminator pupil-fill on simulated imaging performance," Optical Microlithography XIII, C.J. Progler, ed., Proceedings of SPIE 4000, p. 804 - 817, SPIE, Santa Clara, 2000.
    • (2000) Proceedings of SPIE , vol.4000 , pp. 804-817
    • Barrett, T.C.1
  • 4
    • 0141541462 scopus 로고    scopus 로고
    • Illumination pupil fill measurement and analysis and its application in scanner VH bias
    • this Proceedings
    • G. Zhang et al., "Illumination pupil fill measurement and analysis and its application in scanner VH bias," this Proceedings.
    • Zhang, G.1
  • 5
    • 0033273523 scopus 로고    scopus 로고
    • Technique for optical characterization of exposure tool imaging performance down to 100 nm
    • I. Grodnensky, et al., "Technique for optical characterization of exposure tool imaging performance down to 100 nm," Journal of Vacuum Science & Technology B 17(6), p. 3285 - 3290, 1999.
    • (1999) Journal of Vacuum Science & Technology B , vol.17 , Issue.6 , pp. 3285-3290
    • Grodnensky, I.1
  • 6
    • 0005812793 scopus 로고    scopus 로고
    • Double exposure optical CD characterization
    • PennWell
    • S. Renwick, I. Grodnensky, and E. Morita, "Double exposure optical CD characterization," Microlithography World 10(4), p. 12 - 21, PennWell, 2001.
    • (2001) Microlithography World , vol.10 , Issue.4 , pp. 12-21
    • Renwick, S.1    Grodnensky, I.2    Morita, E.3
  • 7
    • 0035758717 scopus 로고    scopus 로고
    • Application of CD error budget analysis to ArF scanner performance
    • Optical Microlithography XIV, C.J. Progler, ed
    • S.P. Renwick and J.M. Brown, "Application of CD error budget analysis to ArF scanner performance," Optical Microlithography XIV, C.J. Progler, ed, Proceedings of SPIE 4346, p. 1587 - 1598, 2001.
    • (2001) Proceedings of SPIE , vol.4346 , pp. 1587-1598
    • Renwick, S.P.1    Brown, J.M.2
  • 8
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.