Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Fühner, Tim ^a   Popp, Stephan ^b   Dürr, Christoph ^c   Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b UNIVERSITY OF APPLIED SCIENCES REGENSBURG   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Automatic Optimization; Genetic Algorithms; High Performance Computing; Resolution Enhancement Techniques

Indexed keywords

COMPUTATIONAL COMPLEXITY; GENETIC ALGORITHMS; LIGHTING; MASKS; NUMERICAL ANALYSIS; OPTICAL RESOLVING POWER; OPTIMIZATION; QUADRATIC PROGRAMMING;

AUTOMATIC OPTIMIZATION; HIGH PERFORMANCE COMPUTING; PYTHON POWERED FRAMEWORK TWISTED; RESOLUTION ENHANCEMENT TECHNIQUES;

PHOTOLITHOGRAPHY;

EID: 33745798400     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656197     Document Type: Conference Paper

References (16)

1. A. K. Wong, Resolution Enhancement Techniques in Optical Lithography, SPIE Press, 2001.
2. B. Smith, "Mutual optimization of resolution enhancement techniques," Journal of Microlithography, Microfabrication, and Microsystems 1, p. 95, 2002.
3. A. Rosenbluth, S. Bukowski, M. Hibbs, K. Lai, A. Molles, R. Singh, and A. Wong, "Optimum mask and source patterns to print a given shape," in Proc. SPIE 4346, p. 486, 2001.
4. Y. Oh, J. Lee, and S. Lim, "Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12-μm mask pattern," in Proc. SPIE 3679, pp. 607-613, 1999.
5. R. Socha and al., "Contact hole recticle optimization by using interference mapping lithography (IMC)," in Proc. SPIE 5377, pp. 222-240, 2004.
6. Y. Granik, "Source optimization for image fidelity and throughput," JM3 3(4), pp. 509-522, 2004.
7. Y. Granik, "Solving inverse problems of optical microlithography, " in Proc. SPIE 5754, pp. 506-526, 2005.
8. A. Poonawala and P. Milanfar, "Fast and low-complexity model-based optical proximity correction and phase-shift mask design," in Proc. SPIE 6154, 2006. to appear.
9. T. Fühner and A. Erdmann, "Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm," in Proc. SPIE 5754, pp. 506-526, 2005.
10. J. H. Holland, Adaptation in Natural and Artificial Systems, The MIT Press, Cambridge, MA, 1992.
11. P. Moscato, "On evolution, search, optimization, genetic algorithms and martial arts: Towards memetic algorithms," C3P Report 826, pp. 1087-1091, 1989.
12. P. Spellucci, Numerische Verfahren der nichtlinearen Optimierung, Birkhaeuser Verlag, 1993.
13. W. Gropp, E. Lusk, and A. Skjellum, Portable Parallel Programming with the Message Passing Interface, MIT Press, Cambridge, MA, 1999.
14. A. Geist, A. Beguelin, J. Dongarra, W. Jiang, R. Manchek, and V. Sunderam, PVM: Parallel Virtual Machine, MIT press, 1994.
15. "Python homepage." www.python.org.
16. A. Fetting, Twisted Network Programming Essentials, O'Reilly, Sebastopol, CA, 2005.