Alkene/diamond liquid/solid interface characterization using internal photoemission spectroscopy

Langmuir

Volumn 22, Issue 13, 2006, Pages 5645-5653

  Nebel, C E ^a   Shin, D ^a   Takeuchi, D ^a   Yamamoto, T ^a,b   Watanabe, H ^a   Nakamura, T ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; CHEMICAL VAPOR DEPOSITION; DIAMONDS; HETEROJUNCTIONS; OLEFINS; PHOTOCONDUCTIVITY; PHOTOEMISSION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKENE MOLECULES; INTERNAL PHOTOEMISSION (IPE) SPECTROSCOPY; OPTICAL ELECTRON EXCITATIONS; SURFACE STATES;

INTERFACES (MATERIALS);

ALKENE; DIAMOND; TRIFLUOROACETIC ACID;

ARTICLE; CHEMISTRY; ELECTRICITY; METHODOLOGY; PHOTOCHEMISTRY; SPECTROPHOTOMETRY; SURFACE PROPERTY;

ALKENES; DIAMOND; ELECTROSTATICS; PHOTOCHEMISTRY; SPECTROPHOTOMETRY; SURFACE PROPERTIES; TRIFLUOROACETIC ACID;

EID: 33745786801     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la052685s     Document Type: Article

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