Atomic layer deposition of hafnium silicate thin films using HfCl 2[N(SiMe3)2]2

Studies in Surface Science and Catalysis

Volumn 159, Issue , 2006, Pages 373-376

  Nam, Won Hee ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33745786770     PISSN: 01672991     EISSN: None     Source Type: Book Series    
DOI: 10.1016/s0167-2991(06)81611-3     Document Type: Conference Paper

References (9)

1. G. D. Wilk, R. M. Wallace and J. M. Anthony, Appl. Phy. Rev., 89 (2001) 5243.
2. G. D. Wilk and R. M. Wallace, Appl. Phy. Lett., 74 (1999) 2854.
3. W. Kim, S. Rhee, N., J. Lee and H. Kang, J. Vac. Sci. Technol. A, 22(4) (2004) 1285.
4. W. Nam and S. Rhee, Electrochem. Solid-state Lett., 7(4) (2004) C55.
5. R. A. Andersen, Inorg. Chem., 18 (1979) 2928.
6. S. Kang and S. Rhee, J. Vac. Sci. Technol., A22(6) (2004) 2392.
7. J. Kim and K. Yong, J. Electrochem. Soc., 152(4) (2005) F45.
8. E. J. Kim and W. N. Gill, J. Electrochem. Soc., 142 (1995) 676.
9. V. K. Bhat and A. Subrahmanyam, Semicond. Sci. Technol., 15 (2000) 883.