The meef shall inherit the earth

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 251-258

  Conley, Will ^a   Garza, Cesar ^a   Dusa, Mircea ^b   Socha, Robert ^b   Bendik, Joseph ^c   Mack, Chris ^d  

^a MOTOROLA INC   (United States)

^b ASML   (Netherlands)

^c Dynamic Intelligence Inc   (United States)

^d KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE EQUIPMENT; ERROR ANALYSIS; IMAGING TECHNIQUES; LIGHTING; LOGIC DEVICES; MASKS; PHASE SHIFT; ULTRAVIOLET RADIATION;

MASK ERROR FACTOR (MEEF);

PHOTORESISTS;

EID: 0035758308     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435725     Document Type: Article

References (7)

1. Mauer et al., "Process Proximity Correction using an Automated Software Tool, ", Proc. SPIE, vol 3334, pp. 245-253.
2. Bruce Smith, "Variations to the Influence of Lens Aberration Invoked with PSM and OAI", Proc SPIE vol. 3679, pp. 330-346.
3. Robert Gleason, Panel Discussion on Mask Error Factor, SPIE Conference on Microlithography '99.
4. W. Conley et al. "Reductions in MEEF Through Resist and Process Design", ARCH Interface Conference on Microlithography, San Diego, CA 1999.
5. A. Wong et al. "Lithographic Effects of Mask Critical Dimension Error, SPIE Vol 3334, pp. 106-116, 1998.
6. th Annual BACUS Symposium on Photomask Technology and Management, Monterey, CA, 1999.
7. W. Conley et al. "Understanding the Impact of Full Field MEF", Proc. SPIE Vol.4000, pp. 580-587.