Reticle enhancement verification for the 65nm and 45nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Lucas, Kevin ^a   Patterson, Kyle ^a   Boone, Robert ^a   Miramond, Corinne ^b   Borjon, Amandine ^c   Belledent, Jerome ^c   Toublan, Olivier ^d   Entradas, Jorge ^d   Trouiller, Yorick ^e  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b STMICROELECTRONICS   (France)

^c NXP SEMICONDUCTORS   (Netherlands)

^d MENTOR GRAPHICS CORPORATION   (United States)

^e CEA LETI   (France)

Author keywords

Lithography; OPC; RET; Verification

Indexed keywords

OPTICAL RESOLVING POWER; OPTICAL VARIABLES CONTROL; PHOTOLITHOGRAPHY; PRODUCT DESIGN;

OPC; RET; VERIFICATION;

ELECTRONICS INDUSTRY;

EID: 33745785042     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658823     Document Type: Conference Paper

References (9)

1. Olivier Toublan, et. al. Verification requirements for 45nm and 65nm OPC. Proc. of Fuji Film Interface, 2005.
2. Chris Spence. Full-chip lithography simulation and design analysis: how OPC is changing IC design. Proc. of SPIE, Vol. 5751, 2005.
3. Shih Chieh Lo, et. al. Identifying process window marginalities of reticle designs for 0.15/0.13-um technologies, Proc. of SPIE, Vol. 5130, 2003.
4. Yuri Granik, et. al. Subresolution process windows and yield estimation technique based on detailed full-chip CD simulation, Proc. of SPIE, Vol. 4182, 2002.
5. Olivier Toublan, et. al. Fully automatic side lobe detection and correction technique for attenuated phase-shift masks, Proc. of SPIE, Vol. 4346, 2001.
6. Jerome Belledent, et. al. Critical failure ORC: application to the 90-nm and 65-nm nodes. Proc. of SPIE, Vol. 5377, 2004.
7. F. Gennari, A. R. Neureuther. Proc. of SPIE Vol. 4562, pp 1077-1086, 2002.
8. James Word, Nicolas B. Cobb. Enhanced model-based OPC for 65 nm and below, Proc. of SPIE, Vol. 5567, 2004.
9. Kyle Patterson, et. al. Improving model-based OPC performance for the 65-nm node through calibration structure set optimization. Proc. of SPIE Vol. 5756, 2005.