Fluids and resists for hyper NA immersion lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 836-846

  Taylor, J Christopher ^a   Shayib, Ramzy ^a   Goh, Sumarlin ^a   Chambers, Charles R ^a   Conley, Will ^b   Lin, Shang Ho ^b   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGHER INDEX RESISTS; IMMERSION FLUIDS; IMMERSION LITHOGRAPHY; RESIST SYSTEMS;

CALCIUM COMPOUNDS; CONTACT ANGLE; ELLIPSOMETRY; FLUID DYNAMICS; LIGHT REFRACTION; MATHEMATICAL MODELS; PH EFFECTS; REFRACTIVE INDEX; SPECTROSCOPIC ANALYSIS; VISCOSITY;

PHOTORESISTS;

EID: 24644451073     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600771     Document Type: Conference Paper

References (10)

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3. Immersion and 157 nm Symposium, Vancouver, B.C., Canada, 2004.
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8. Synowicki, R. A.; Pribil, G. K.; Cooney, G. T.; Herzinger, C. M.; Green, French, R. H.; Yang, Burnett, J. H.; Kaplan, S. J. Vac. Sci. Technol. B 22(6), 2004.
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10. Chambers, C. R. To be published.