Design-friendly DFM rule

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Osawa, Morimi ^a   Minami, Takayoshi ^a   Futatsuya, Hiroki ^a   Asai, Satoru ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

DFM; Gate length variation; Litho Friendly design; Preferred rule; Recommended rule; Standard cell

Indexed keywords

GATES (TRANSISTOR); MICROPROCESSOR CHIPS; OPTIMIZATION; PHOTOLITHOGRAPHY; STATISTICAL METHODS;

DFM; GATE LENGTH VARIATION; LITHO-FRIENDLY DESIGN; PREFERRED RULE; RECOMMENDED RULE; STANDARD CELLS;

OPTICAL DESIGN;

EID: 33745775863     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656271     Document Type: Conference Paper

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