Process centering OPC using design intent to improve yield

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 331-339

  Cote, Michel ^a   Miloslavsky, Alex ^a   Lugg, Robert ^a   Rieger, Mike ^a   Hurat, Philippe ^a,b  

^a SYNOPSYS INC   (United States)

^b Clear Shape Technologies Inc   (United States)

Author keywords

Design intent; DFM; Mask; OPC; Yield

Indexed keywords

OPTICAL DESIGN; OPTICAL ENGINEERING; OPTIMIZATION; PATTERN RECOGNITION;

DESIGN INTENT; DFM; MASK; OPC; YIELD;

OPTICAL SYSTEMS;

EID: 25144449563     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600180     Document Type: Conference Paper

References (4)

1. Gale Morrison, "Mask Costs Jumping", ElectronicNews, 6/7/1999, http://www.reed-electronics.com/electronicnews/article/CA70282.html,
2. Laura Peters, "Demystifying Design-For-Yield", Reed Electronics Group, Semiconductor International, 7/1/2004
3. Michel Cote, Philippe Hurat Ph.D., Synopsys Inc, "Standard Cell Printability Grading and Hot Spot Detection", ISQED 2005
4. Srinivas Raghvendra, Synopsys Inc, "One Size Doesn't Fit All", OEmagazine, http://oemagazine.com/fromTheMagazine/feb04/microchips.html