Layout and source dependent transmission tuning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 315-326

  Progler, Chris ^a   Conley, Will ^b   Socha, Bob ^c   Ham, Young ^a  

^a PHOTRONICS INC   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c ASML US Inc   (United States)

Author keywords

High transmission mask; Image optimization; Logic circuits; Resolution enhancement technology; Source optimization

Indexed keywords

HIGH TRANSMISSION MASKS; IMAGE OPTIMIZATION; RESOLUTION ENHANCEMENT TECHNOLOGY; SOURCE OPTIMIZATION;

ALGORITHMS; IMAGE ANALYSIS; IMAGING TECHNIQUES; LIGHT SOURCES; LOGIC CIRCUITS; OPTIMIZATION; PHASE SHIFT; PHOTOLITHOGRAPHY;

LIGHT TRANSMISSION;

EID: 25144511363     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601770     Document Type: Conference Paper

References (9)

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