High-resolution capability of optical near-field imprint lithography

Applied Physics B: Lasers and Optics

Volumn 84, Issue 1-2, 2006, Pages 265-267

  Yatsui, T ^a   Nakajima, Y ^b   Nomura, W ^b   Ohtsu, M ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIC FILMS; OPTICAL RESOLVING POWER; OPTIMIZATION; SILICON;

FINITE-DIFFERENCE TIME-DOMAIN CALCULATION METHOD; OPTICAL NEAR-FIELD INTENSITY; SIDEWALL COATING;

LITHOGRAPHY;

EID: 33745712647     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-006-2328-5     Document Type: Article

References (7)

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