SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Photopolymer Science and Technology

Volumn 18, Issue 3, 2005, Pages 435-441

Fabrication of sub-100 nm patterns using near-field mask lithography with ultra-thin resist process

(7) Ito, Toshiki a Ogino, Masaya a Yamada, Tomohiro a Inao, Yasuhisa a Yamaguchi, Takako a Mizutani, Natsuhiko a Kuroda, Ryo a

a CANON INC (Japan)

Author keywords

Chemically amplified resist; Dry etching; Electro magnetic analysis; Near field light; Photolithography; Tri layer resist process

Indexed keywords

EID: 22144479755 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.18.435 Document Type: Article

Times cited : (21)

References (16)

1
- 0142037327
- S. Y. Chou, P. R. Krauss and P. J. Renstrom, Appl. Phys. Lett., 67, 3114(1995)
- (1995) Appl. Phys. Lett. , vol.67 , pp. 3114
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

2
- 0032625408
- M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt and C. G. Willson, Proc. SPIE, 3676, 379(1999)
- (1999) Proc. SPIE , vol.3676 , pp. 379
- Colburn, M.¹ Johnson, S.² Stewart, M.³ Damle, S.⁴ Bailey, T.⁵ Choi, B.⁶ Wedlake, M.⁷ Michaelson, T.⁸ Sreenivasan, S.V.⁹ Ekerdt, J.¹⁰ Willson, C.G.¹¹

3
- 0000153075
- E. B. Cooper and S. R. Manalis, Appl. Phys. Lett., 75, 3566(1995)
- (1995) Appl. Phys. Lett. , vol.75 , pp. 3566
- Cooper, E.B.¹ Manalis, S.R.²

4
- 22144457517
- United States Patent, US 6171730
- R. Kuroda, T. Ikeda, Y. Shimada, United States Patent, US 6171730, (1997)
- (1997)
- Kuroda, R.¹ Ikeda, T.² Shimada, Y.³

5
- 0031651047
- th Int. Workshop on MEMS, 488(1998)
- (1998) th Int. Workshop on MEMS , pp. 488
- Ono, T.¹ Esashi, M.²

6
- 0000070622
- M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming, Appl. Phys. Lett., 75, 3560(1999)
- (1999) Appl. Phys. Lett. , vol.75 , pp. 3560
- Alkaisi, M.M.¹ Blaikie, R.J.² McNab, S.J.³ Cheung, R.⁴ Cumming, D.R.S.⁵

7
- 22144463755
- T. Yamaguchi, Y. Inao, T. Yamada, N. Mizutani and R. Kuroda, O plus E, 25, 1336(2003)
- (2003) O Plus E , vol.25 , pp. 1336
- Yamaguchi, T.¹ Inao, Y.² Yamada, T.³ Mizutani, N.⁴ Kuroda, R.⁵

8
- 0037676507
- T. Yoshimura, H. Shiraishi, J. Yamamoto and S. Okazaki, Appl. Phys. Lett., 63, 764(1993)
- (1993) Appl. Phys. Lett. , vol.63 , pp. 764
- Yoshimura, T.¹ Shiraishi, H.² Yamamoto, J.³ Okazaki, S.⁴

9
- 84975363340
- K. Itaya and K. Shibayama, J. Electrochem. Soc., 129, 663(1982)
- (1982) J. Electrochem. Soc. , vol.129 , pp. 663
- Itaya, K.¹ Shibayama, K.²

10
- 0021461296
- G. N. Taylor, L. E. Stillwagon and T. Venkatesan, J. Electrochem. Soc., 131, 1658(1984)
- (1984) J. Electrochem. Soc. , vol.131 , pp. 1658
- Taylor, G.N.¹ Stillwagon, L.E.² Venkatesan, T.³

11
- 0001183537
- F. Coopmans and B. Roland, Proc. SPIE, 633, 126(1986)
- (1986) Proc. SPIE , vol.633 , pp. 126
- Coopmans, F.¹ Roland, B.²

12
- 22144498008
- M. Hatzakis, J. Paraszczak and J. Shaw, Proc. Int'l. Conf. Micro-lithography, 386(1981)
- (1981) Proc. Int'l. Conf. Micro-lithography , pp. 386
- Hatzakis, M.¹ Paraszczak, J.² Shaw, J.³

13
- 0020832325
- M. Morita, A. Tanaka, S. Imamura, T. Tamamura and O. Kogure, Jpn. J. Appl. Phys., 22, L659(1983)
- (1983) Jpn. J. Appl. Phys. , vol.22
- Morita, M.¹ Tanaka, A.² Imamura, S.³ Tamamura, T.⁴ Kogure, O.⁵

14
- 84915416825
- G. W. Ray, S. Peng, D. Burriesci, M. M. O'Toole and E. Liu, J. Electrochem. Soc., 129, 2152(1982)
- (1982) J. Electrochem. Soc. , vol.129 , pp. 2152
- Ray, G.W.¹ Peng, S.² Burriesci, D.³ O'Toole, M.M.⁴ Liu, E.⁵

15
- 0019637313
- S. P. Lyman, J. L. Jackel and P. L. Liu, J. Vac. Sci. Technol., 19, 1325(1981)
- (1981) J. Vac. Sci. Technol. , vol.19 , pp. 1325
- Lyman, S.P.¹ Jackel, J.L.² Liu, P.L.³

16
- 0018545401
- J. M. Moran and D. Maydan, J. Vac. Sci. Technol., 16, 1620(1979)
- (1979) J. Vac. Sci. Technol. , vol.16 , pp. 1620
- Moran, J.M.¹ Maydan, D.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.