Transient sputtering of an amorphous Si surface under low energy O 2+ ion bombardment

Journal of Applied Physics

Volumn 99, Issue 12, 2006, Pages

  Lee, Hyung Ik ^a   Kang, Hee Jae ^b   Moon, Dae Won ^c  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Chungbuk National University   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SCATTERING; ION BOMBARDMENT; MONTE CARLO METHODS; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

DIFFUSION EFFECTS; TRANSIENT PROCESSES; TRANSIENT SPUTTERING;

AMORPHOUS SILICON;

EID: 33745711607     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2205355     Document Type: Article

References (17)

1. P. C. Zalm, Rep. Prog. Phys. 58, 1321 (1995).
2. Z. X. Jiang and P. F. A. Alkemade, Surf. Interface Anal. 27, 125 (1999).
3. H. I. Lee, H. K. Kim, K. J. Kim, D. W. Moon, H. K. Shon, H. C. Shin, and H. J. Kang, Surf. Interface Anal. 36, 259 (2004).
4. W. Vandervorst, F. R. Shepherd, J. Newman, B. F. Phillips, and J. Remmerie, J. Vac. Sci. Technol. A 3, 1359 (1985).
5. K. Wittmaack, Surf. Interface Anal. 29, 721 (2000).
6. B. G. Svensson and B. Mohadjeri, J. Appl. Phys. 76, 3831 (1994).
7. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Range of Ions in Solids (Pergamon, New York, 1985), Vol. 1.
8. H. De Witte, W. Vandervorst, and R. Gijbels, J. Appl. Phys. 89, 3001 (2001).
9. H. I. Lee and R. Shimizu, J. Vac. Sci. Technol. B 16, 2528 (1998).
10. M. T. Robinson, Phys. Rev. B 27, 5347 (1983).
11. H. J. Kang, R. Shimizu, T. Saito, and H. Yamakawa, J. Appl. Phys. 62, 2733 (1987).
12. J. B. Clegg, J. Vac. Sci. Technol. A 89, 2660 (1995).
13. J. L. Alay and W. Vandervorst, Phys. Rev. B 50, 15015 (1994).
14. W. O. Hofer and U. Littmark, Phys. Lett. 71, 457 (1979).
15. H. J. Kang, W. S. Kim, D. W. Moon, H. I. Lee, S. T. Kang, and R. Shimizu, Nucl. Instrum. Methods Phys. Res. B 153, 429 (1999).
16. Y. Kido and T. Koshikawa, J. Appl. Phys. 67, 187 (1990).
17. D. W. Moon, H. I. Lee, K. J. Kim, T. Nishimura, and Y. Kido, Nucl. Instrum. Methods Phys. Res. B 183, 10 (2001).