Synthesis and evaluation of novel resist monomers and copolymers for ArF lilthography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Kitayama, Masahiko ^a   Aratani, Ichihiro ^a   Toriumi, Minoru ^b  

^a KURARAY CO LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Dissociation energy; Dissolution behavior; Mevalonic lactone methacrylate (MLMA); Polar monomer; Quartz crystal microbalance (QCM)

Indexed keywords

ACRYLICS; COPOLYMERS; CRYSTALS; DISSOLUTION; LITHOGRAPHY; QUARTZ;

DISSOCIATION ENERGY; DISSOLUTION BEHAVIOR; MEVALONIC LACTONE METHACRYLATE (MLMA); POLAR MONOMER; QUARTZ CRYSTAL MICROBALANCE (QCM);

MONOMERS;

EID: 33745627802     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656159     Document Type: Conference Paper

References (8)

1. M. Toriumi, T. Ohfuji, M. Endo, and H. Morimoto, J. Photopolym. Sci. Technol., 12 (1999) 545.
2. T. Wallow, W. Chan, W. Hinsberg, and S-W. Lee, Proc. SPIE, 4690 (2002) 299.
3. W. Hinsberg, F. Houle, and H. Ito, Proc. SPIE, 5376 (2004) 352.
4. S. Takechi, Y. Kaimoto, K. Nozaki, and N. Abe, J. Photopolym. Sci. Technol., 5 (1992) 439.
5. K. Maeda, K. Nakano, T. Ohfuji, and E. Hasegawa, Proc. SPIE, 2724 (1996) 377.
6. K. Nozaki and E. Yano, J. Photopolym. Sci. Technol., 10 (1997) 545.
7. Y. Uetani, H. Fujishima, Y. Miya, and I. Takemoto, Proc. SPIE, 3333 (1998) 546.
8. T. Ogata, S. Matsumsru, R. Takahashi, K. Kasai, Y. Kinoshita, H. Hada, and M. Shirai, J. Photopolym. Sci. Technol., 18 (2005) 393.