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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 546-553

Standard developer available ArF resist and performance

(4) Uetani, Yasunori a Fujishima, Hiroaki a Miya, Yoshiko a Takemoto, Ichiki a

a SUMITOMO CHEMICAL CO LTD (Japan)

Author keywords

Adhesion; Alicyclic; ArF; Maleic anhydride; Norbornene

Indexed keywords

COPOLYMERIZATION; KRYPTON; MALEIC ANHYDRIDE; ORGANIC ACIDS; PHOTORESISTORS; POLYMERS; RESINS; STANDARDS;

ALICYCLIC; ALTERNATING COPOLYMERS; ARF; ARF RESISTS; DRY-ETCHING RESISTANCES; HYDROPHOBIC NATURES; KRF RESISTS; MASS PRODUCTIONS; NORBORNENE; ONIUM SALTS; POOR ADHESIONS; RESIN COMPONENTS; WEAK ORGANIC ACIDS;

ADHESION;

EID: 3142545416 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.312445 Document Type: Conference Paper

Times cited : (4)

References (6)

1
- 84994439515
- Resolution and Etch Resistance of a Family of 193nm Positive Resists
- R.D.Allen, I.Y.Wan, G.M.Wallraff, R.A.Dipietro and D.C.Hofer "Resolution and Etch Resistance of a Family of 193nm Positive Resists" J. of Photopolymer Sci. and Tech. Vol.8 No.4 pp.623-636, 1995
- (1995) J. of Photopolymer Sci. and Tech , vol.8 , Issue.4 , pp. 623-636
- Allen, R.D.¹ Wan, I.Y.² Wallraff, G.M.³ Dipietro, R.A.⁴ Hofer, D.C.⁵

2
- 0029727827
- Novel Alkaline-Soluble Alicyclic Poly(TCDMACOOH) for ArF Chemically Amplified Positive Resists
- K.Maeda, K.Nakano, T.Ohfuji and E.Hasegawa "Novel Alkaline-Soluble Alicyclic Poly(TCDMACOOH) for ArF Chemically Amplified Positive Resists" Proc.of SPIE 2724, pp.377-385, 1996
- (1996) Proc.of SPIE , vol.2724 , pp. 377-385
- Maeda, K.¹ Nakano, K.² Ohfuji, T.³ Hasegawa, E.⁴

3
- 0029727391
- Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-LayerPhotoresists for 193nm Photolithografphy
- T.I.Wallow, F.M.Houlihan, O.Nalamasu, E.A.Chandross, T.X.Neeman and E.Reichmanis "Evaluation of Cycloolefin-Maleic Anhydride Alternating Copolymers as Single-LayerPhotoresists for 193nm Photolithografphy" Proc.of SPIE 2724, pp.355-364, 1996
- (1996) Proc.of SPIE , vol.2724 , pp. 355-364
- Wallow, T.I.¹ Houlihan, F.M.² Nalamasu, O.³ Chandross, E.A.⁴ Neeman, T.X.⁵ Reichmanis, E.⁶

4
- 33749291941
- S.Takechi, M.Takahashi, A.Kotachi, K.Nozaki, E.YanoY.Kaimoto and I.Hanyu Impact of 2-Methyl-2-Adamantyl Group Used for Single-Layer Resist J. of Photopolymer Sci. and Tech. 9 No.3 pp.475-488, 1996
- S.Takechi, M.Takahashi, A.Kotachi, K.Nozaki, E.YanoY.Kaimoto and I.Hanyu "Impact of 2-Methyl-2-Adamantyl Group Used for Single-Layer Resist" J. of Photopolymer Sci. and Tech. Vol.9 No.3 pp.475-488, 1996

5
- 0000921871
- Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
- S.Iwasa, K.maeda, K.Nakano, T.Ohfuji and E.Hasegawa "Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists" J. of Photopolymer Sci. and Tech. Vol.9 No.3 pp.447-456, 1996
- (1996) J. of Photopolymer Sci. and Tech , vol.9 , Issue.3 , pp. 447-456
- Iwasa, S.¹ maeda, K.² Nakano, K.³ Ohfuji, T.⁴ Hasegawa, E.⁵

6
- 33745560225
- New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists
- K.Nozaki and E.Yano "New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists" J. of Photopolymer Sci. and Tech. Vol.10 No.4 pp.545-550, 1997
- (1997) J. of Photopolymer Sci. and Tech , vol.10 , Issue.4 , pp. 545-550
- Nozaki, K.¹ Yano, E.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.