Characterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 299-312

  Wallow, Thomas ^a   Chan, Wendy ^a   Hinsberg, William ^a   Lee, Seok Won ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DISSOLUTION; GELS; INTERFACES (MATERIALS); POLYMERS; THIN FILMS;

QUARTZ-CRYSTAL MICROBALANCE;

PHOTORESISTS;

EID: 0036029646     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474228     Document Type: Conference Paper

References (12)

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