Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 846-854

  Meador, Jim D ^a   Shao, Xie ^a   Bhave, Mandar ^a   Cox, Chris ^a   Thompson, John ^a   Thomas, Debra ^a   Gibbons, Stephen ^a   Farnsworth, Ashley ^a   Rich, Michael ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

193 nm lithography; Antireflective coating; Compatibility; Conformality; Microchips; Thermosetting

Indexed keywords

BINDERS; COPOLYMERIZATION; CROSSLINKING; LITHOGRAPHY; OPTIMIZATION; PLASMA ETCHING; PLASTIC FILMS; POLYMER BLENDS;

POLYMERIC BINDERS;

ANTIREFLECTION COATINGS;

EID: 0034756493     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436918     Document Type: Article

References (10)

1. Start UP of 193 nm lithography development in Europe
2. Extending optical lithography to 0.25 μm and below
3. Materials evaluation of antireflective coatings for single-layer 193 nm lithography
4. Second-generation 193-nm bottom antireflective coatings (BARCs)
5. Organic antireflective coatings for 193nm lithography
6. New antireflective coatings for 193 nm lithography
7. Oxygen plasma removal of thin polymer films
8. Recent progress in 193nm antireflective coatings