SCOPUS 정보 검색 플랫폼

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 491-501

32nm node technology development Using interference immersion lithography

(6) Sewell, Harry a McCafferty, Diane a Markoya, Louis a Hendrickx, Eric b Hermans, Jan b Ronse, Kurt b

a ASML US Inc (United States)

b IMEC (Belgium)

Author keywords

193nm Immersion Lithography; 32nm node; 38nm node; ArF Immersion Lithography; High n Immersion Fluids

Indexed keywords

COST EFFECTIVENESS; FLUID STRUCTURE INTERACTION; IMAGING TECHNIQUES; LIGHT POLARIZATION; LIGHTING; REFRACTIVE INDEX; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; WATER;

193NM IMMERSION LITHOGRAPHY; 32NM NODES; 38NM NODES; ARF IMMERSION LITHOGRAPHY; HIGH-N IMMERSION FLUIDS;

PHOTOLITHOGRAPHY;

EID: 24644437492 PISSN: 16057422 EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.601012 Document Type: Conference Paper

Times cited : (14)

References (8)

1
- 24644506732
- SPIE, Conference #5754
- J.H.Burnett, S.G. Kaplan, et.al., "High-index materials for 193-nm and 157-nm immersion lithography", SPIE, 2005, Conference #5754.
- (2005) High-index Materials for 193-nm and 157-nm Immersion Lithography
- Burnett, J.H.¹ Kaplan, S.G.²

2
- 24644518625
- SPIE, Conference #5754
- S.Peng, R.H.French, W.Qiu, R.C.Wheland, M.Yang, M.F.Lemon, K.Winey, "Second-generation fluids for 193nm immersion lithography", SPIE, 2005, Conference #5754.
- (2005) Second-generation Fluids for 193nm Immersion Lithography
- Peng, S.¹ French, R.H.² Qiu, W.³ Wheland, R.C.⁴ Yang, M.⁵ Lemon, M.F.⁶ Winey, K.⁷

3
- 25144523396
- SPIE, Conference #5754
- P.Zhang, B.H.Budhlall, X.Gao, et.al., "High-refractive index immersion fluids for 193-nm immersion lithography", SPIE 2005, Conference #5754.
- (2005) High-refractive Index Immersion Fluids for 193-nm Immersion Lithography
- Zhang, P.¹ Budhlall, B.H.² Gao, X.³

4
- 22144493757
- SPIE, Conference #5753
- T.Miyamatsu, Y.Wang, et.al., "Material design for immersion lithography with high-refractive index fluid", SPIE, 2005, Conference #5753.
- (2005) Material Design for Immersion Lithography with High-refractive Index Fluid
- Miyamatsu, T.¹ Wang, Y.²

5
- 22144433305
- SPIE, Conference #5754
- M.Totzeck, P.Graupner, T.Heil, et.al. "How to describe polarization influence on imaging", SPIE, 2005, Conference #5754.
- (2005) How to Describe Polarization Influence on Imaging
- Totzeck, M.¹ Graupner, P.² Heil, T.³

6
- 24644440588
- SPIE, Conference #5754
- D.G.Flagello, S.G.Hansen, B.Geh, et.al., "Challenges with hyper-NA (NA>1.0) polarized light lithography for sub-lambda/4 resolution", SPIE, 2005, Conference #5754.
- (2005) Challenges with Hyper-NA (NA>1.0) Polarized Light Lithography for Sub-lambda/4 Resolution
- Flagello, D.G.¹ Hansen, S.G.² Geh, B.³

7
- 24644462341
- SPIE, Conference #5457
- S.Teuber, K.Bubke, et.al., "Determination of mask-induced polarization effects occurring in hyper-NA immersion lithography", SPIE, 2005, Conference #5457.
- (2005) Determination of Mask-induced Polarization Effects Occurring in Hyper-NA Immersion Lithography
- Teuber, S.¹ Bubke, K.²

8
- 22144459360
- SPIE, Conference #5754
- C.Chen, T.Gau, L.Shiu, B.Lin, "Mask polarization effect in hyper-NA systems", SPIE 2005, Conference #5754.
- (2005) Mask Polarization Effect in Hyper-NA Systems
- Chen, C.¹ Gau, T.² Shiu, L.³ Lin, B.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.