EUV lithography simulation for the 32 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Kim, Eun Jin ^a   Chang, Wook ^a   Park, Jin Back ^a   Kim, Sung Jin ^a   Kim, Jong Sun ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

32 nm node; EUV Lithography; EUV mask; Optimization; Simulation

Indexed keywords

COMPUTER SIMULATION; MASKS; MULTILAYERS; OPTIMIZATION; PATTERN RECOGNITION;

32 NM NODE; EUV LITHOGRAPHY; EUV MASK; SOLID-EUV SIMULATOR;

LITHOGRAPHY;

EID: 33745623634     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656335     Document Type: Conference Paper

References (6)

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