Critical dimension AFM tip characterization and image reconstruction applied to the 45 nm node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Dahlen, Gregory ^a   Osborn, Marc ^a   Liu, Hao Chih ^a   Jain, Rohit ^a   Foreman, William ^a   Osborne, Jason R ^a  

^a VEECO INSTRUMENTS INC   (United States)

Author keywords

AFM; Critical dimension; Image reconstruction; Mathematical morphology; Metrology; Tip characterization

Indexed keywords

CRITICAL DIMENSION; IMAGE ARTIFACTS; TIP CHARACTERIZATION;

COMPUTATIONAL GEOMETRY; IMAGE RECONSTRUCTION; MATHEMATICAL MORPHOLOGY; MEASUREMENTS; SCANNING; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC FORCE MICROSCOPY;

EID: 33745616067     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656848     Document Type: Conference Paper

References (14)

1. R. Dixson et al., "CD-AFM Reference Metrology at NIST and International SEMATECH", Proc. of SPIE, vol. 5752, pp 324-336, 2005
2. International Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, CA, 2005
3. H. Liu, M. Klonowski, D. Kneeburg, G. Dahlen, M. Osborn, T. Bao, "Advanced AFM Probes: Wear Resistant Designs", J. Vac. Sci. Technol. B 23 (6), pp 3090-3093, 2005
4. Y. Martin and H. K. Wickramasinghe, " Method for imaging sidewalls by atomic force microscopy", Appl. Phys. Lett., 64, 2498, 1994
5. E. R. Dougherty and C. R. Giardina, Morphological Methods in Image and Signal-Processing, Prentice Hall, 1988
6. J. S. Villarrubia, Algorithms for scanned probe microscope image simulation, surface reconstruction, and tip estimation, J. Res. Natl. Inst. Stand. Tech. 102, 425, 1997
7. G. Dahlen, M. Osborn, N. Okulan, W. Foreman, A. Chand and J. Foucher, "Tip characterization and surface reconstruction of complex structures with critical dimension atomic force microscopy", J. Vac. Sci. Technol. B 23 (6), pp 2297-2303, 2005
8. Y. Martin and H. K. Wickramasinghe, "Toward accurate metrology with scanning force microscopes", J. Vac. Sci. Technol. B 13 (6), pp 2335-2339, 1995
9. B. Perng et al., "Accurate In-line CD Metrology for Nanometer Semiconductor Manufacturing", to be published in Proc. SPIE, Vol. 6152, 2006
10. VLSI Standards, Inc., www.vlsistandards.com
11. J. S. Villarrubia, in Applied Scanning Probe Methods, edited by B. Bhushan, H. Fuchs and S. Hosaka, Springer, Berlin, p 151, 2004
12. M. A. Klos and S. K. Yedur, "Experiments in mask metrology using a CD FM", Proc. SPIE, Vol. 3998, pp 350-360, 2000
13. H. Liu et al., "Carbon nanotube AFM probes for microlithography process control", to be published in Proc. SPIE, Vol. 6152, 2006
14. D. Keller, "Reconstruction of STM and AFM images distorted by finite-size tips", Surf. Sci., 253, pp 353-364, 1991