Analysis of 193-nm immersion specific defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Otoguro, Akihiko ^a   Lee, Jeung Woo ^a   Itani, Toshiro ^a   Fujii, Kiyoshi ^a   Funakoshi, Tomohiro ^b   Sakai, Tsunehiro ^b   Watanabe, Kenji ^b   Arakawa, Mikio ^c   Nakano, Hitoshi ^c   Kobayashi, Masamichi ^c  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^c CANON INC   (Japan)

Author keywords

193 nm immersion lithography; Immersion specific defect; Quartz crystal microbalance; Swelling; Top coat

Indexed keywords

COATINGS; LITHOGRAPHY; SEMICONDUCTOR MATERIALS; SOLVENTS; WATERMARKING;

193-NM IMMERSION LITHOGRAPHY; IMMERSION SPECIFIC DEFECT; QUARTZ CRYSTAL MICROBALANCE; TOP-COAT;

DEFECTS;

EID: 33745605818     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656086     Document Type: Conference Paper

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