Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 115-125

  LeSuer, Robert J ^a   Fan, Frank F ^a   Bard, Allen J ^a   Taylor, Chris ^b   Tsiartas, Pavlos ^b   Willson, Grant ^b   Conley, Will ^c,e   Feit, Gene ^c   Kunz, Rod ^d  

^a The University of Texas at Austin   (United States)

^b The University of Texas at Austin   (United States)

^c SEMATECH   (United States)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^e MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICALLY AMPLIFIED IMMERSION LITHOGRAPHY; PHOTOACIDS; SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);

ELECTROCHEMISTRY; LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; MICROELECTRODES; MICROSCOPIC EXAMINATION; ORGANIC ACIDS; PHASE INTERFACES;

PHOTORESISTS;

EID: 3843137152     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537527     Document Type: Conference Paper

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