LER characterization and impact on 0.13um lithography for OPC modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 1323-1331

  Nikolsky, Peter ^a   Tweg, Rama ^a   Altshuler, Enna ^a   Shauly, Eitan ^a  

^a TOWER SEMICONDUCTOR LTD   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; DATA ACQUISITION; DATA REDUCTION; IMAGE ANALYSIS; PHOTORESISTS; POLYSILICON; SCANNING ELECTRON MICROSCOPY;

AERIAL IMAGES; LINE EDGE ROUGHNESS (LER); PHOTO ACTIVE COMPONENTS (PAC); RETICLE ENHANCEMENT TECHNIQUES (RET);

OPTICAL VARIABLES MEASUREMENT;

EID: 19844374703     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568999     Document Type: Conference Paper

References (10)

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