Bossung Curves; an old technique with a new twist for sub-90 nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Zavecz, Terrence E ^a  

^a TEA Systems   (United States)

Author keywords

APC; Best Focus; Bossung; CD control; Dose; Dose Mapping; Exposure; IsoFocal; Lithography; OPC validation; Scatterometry; Spatial model

Indexed keywords

APC; BEST FOCUS; BOSSUNG; CD CONTROL; DOSE; DOSE MAPPING; EXPOSURE; ISOFOCAL; OPC VALIDATION; SPATIAL MODEL;

COMPUTER SIMULATION; FOCUSING; OPTICAL SYSTEMS; PERTURBATION TECHNIQUES; PROCESS CONTROL; SCATTERING;

LITHOGRAPHY;

EID: 33745588523     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656642     Document Type: Conference Paper

References (12)

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6. Reprinted in Microlithography World, 3(1) (Winter 1994)
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11. T. Zavecz, "Full-field feature profile models in process control", SPIE 5755-15 (2005).
12. See reference # 1.