A novel focus monitoring method using double side chrome mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 303-314

  Shiode, Yoshihiro ^a   Morohoshi, Hiroshi ^a   Takagi, Atsushi ^a   Fujimaru, Kohei ^a   Mizumoto, Kazushi ^a   Takahashi, Yuki ^a  

^a CANON INC   (Japan)

Author keywords

CD uniformity; Extension of exposure tools; Focus budget; Focus control; Focus monitor; Lithography

Indexed keywords

FOCUSING; OPTICAL DEVICES; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS); SHRINKAGE;

CD UNIFORMITY; EXTENSION OF EXPOSURE TOOLS; FOCUS BUDGET; FOCUS CONTROL; FOCUS MONITOR;

MASKS;

EID: 25144462492     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600170     Document Type: Conference Paper

References (5)

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4. Benchmark Technologies, http://www.benchmarktech.com
5. H.Nomura, "New phase shift gratings for measureing aberrations," SPIE Vol.4346, p25-33, 2001