The effect of plasma chemistry on the damage induced to porous SiCOH dielectrics

Journal of the Electrochemical Society

Volumn 153, Issue 8, 2006, Pages

  Grill, A ^a   Patel, V ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTROCHEMISTRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; POROUS SILICON; REFRACTIVE INDEX; THIN FILMS;

BONDING STRUCTURE; FILM SHRINKAGE; PLASMA CHEMISTRY; PLASMA TREATMENTS;

DIELECTRIC MATERIALS;

EID: 33745490557     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2205162     Document Type: Article

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