Interaction of hydrogen plasma with extreme low-k SiCOH dielectrics

Journal of the Electrochemical Society

Volumn 151, Issue 6, 2004, Pages

  Grill, A ^a   Patel, V ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; LEAKAGE CURRENTS; PERMITTIVITY; PHOTORESISTORS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; THIN FILMS;

HYDROGEN PLASMA; PHOTORESIST STRIPPING; SILICON INSULATOR METAL (SIM);

PLASMAS;

EID: 2942655393     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1723500     Document Type: Article

References (6)

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2. Y. H. Kim, H. J. Kim, J. Y. Kim, and Y. Lee, J. Korean Phys. Soc., 40, 94 (2002).
3. A. Grill and V. Patel, Appl. Phys. Lett., 79, 803 (2001).
4. A. Grill and V. Patel, Mater. Res. Soc. Symp. Proc., 612, D2.9.1 (2000).
5. A. Grill, J. Appl. Phys., 93, 1785 (2003).
6. A. Grill, V. Patel, K. P. Rodbell, E. Huang, and S. Christiansen, Mater. Res. Soc. Symp. Proc., 716, 569 (2002).