Effect of substrate material and bias on properties of TiN films deposited in the hybrid plasma reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1655-1659

  Bardos L ^a   Barankova H ^a   Gustavsson, L E ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON CYCLOTRON RESONANCE; MAGNETIC FIELDS; MAGNETRON SPUTTERING; MICROWAVES; PLASMAS; SILICON; STEEL; SUBSTRATES; THIN FILMS;

HYBRID PLASMA REACTOR; MAGNETIZED PLASMA SYSTEMS; SUBSTRATE MATERIAL; SURFACE BOMBARDMENT; VOLTAGE-CURRENT MEASUREMENTS;

TITANIUM NITRIDE;

EID: 33745485500     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2167082     Document Type: Article

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