Plasma diagnostics in silane-methane-hydrogen plasmas under pm-Si1-xCx:H deposition conditions: Correlation with film properties

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 959-963

  Suendo, V ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

H2 Fulcher ; Particle formation; Photoluminescence; Plasma diagnostics; Polymorphous silicon carbon; Silicon nanocrystals

Indexed keywords

AGGLOMERATION; DEPOSITION; EMISSION SPECTROSCOPY; NUCLEATION; PHOTOLUMINESCENCE; PLASMA DIAGNOSTICS;

H2 FULCHER Α; PARTICLE FORMATION; POLYMORPHOUS SILICON CARBON; SILICON NANOCRYSTALS;

NANOSTRUCTURED MATERIALS;

EID: 33745449206     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.12.052     Document Type: Article

References (19)

1. Kleider J.P., Longeaud C., Gauthier M., Meaudre M., Meaudre R., Butté R., Vignoli S., and Roca i Cabarrocas P. Appl. Phys. Lett. 75 (1999) 3351
2. Fontcuberta i Morral A., Hofmeister H., and Roca i Cabarrocas P. J. Non-Cryst. Solids 299-302 (2002) 284
3. Poissant Y., Chatterjee P., and Roca i Cabarrocas P. J. Non-Cryst. Solids 299-302 (2002) 1173
4. Saadane O., Longeaud C., Lebib S., and Roca i Cabarrocas P. Thin Solid Films 427 (2003) 241
5. Suendo V., Patriarche G., and Roca i Cabarrocas P. Opt. Mater. 27 (2005) 953
6. Kharchenko A.V., Suendo V., and Roca i Cabarrocas P. Thin Solid Films 427 (2003) 236
7. In: Bouchoule A. (Ed). Dusty Plasma (1999), John Wiley & Sons, Inc., New York 162, 245
8. Suendo V., Kharchenko A.V., and Roca i Cabarrocas P. Thin Solid Films 451&452 (2004) 259
9. Daineka D., Suendo V., and Roca i Cabarrocas P. Thin Solid Films 468 (2004) 298
10. Perrin J., Böhm C., Etemadi R., and Lloret A. Plasma Sources Sci. Technol. 3 (1994) 252
11. Géraud-Grenier I., Massereau-Guilbaud V., and Plain A. Eur. Phys. J. AP 8 (1999) 53
12. Islam Md.N., and Kumar S. J. Appl. Phys. 93 (2003) 1753
13. Roca i Cabarrocas P., Chaâbane N., Kharchenko A.V., and Tchakarov S. Plasma Phys. Control. Fusion 46 (2004) B235
14. Chaâbane N., Roca i Cabarrocas P., and Vach H. J. Non-Cryst. Solids 338-340 (2004) 51
15. Boeuf J.P. Phys. Rev. A 46 (1992) 7910
16. Gicquel A., Chenevier M., Hassouni Kh., Tserepi A., and Dubus M. J. Appl. Phys. 83 (1998) 7504
17. Xiao B., Kado S., Kajita S., and Yamasaki D. Plasma Phys. Control. Fusion 46 (2004) 653
18. Bouchoule A., and Ranson P. J. Vac. Sci. Technol. A 9 (1991) 317
19. Tessler L.R., and Solomon I. Phys. Rev. B 52 (1995) 10962