메뉴 건너뛰기




Volumn 513, Issue 1-2, 2006, Pages 374-379

Bias sputter deposited Ni/Al2O3 cermet thin films for gas flow sensors

Author keywords

Bias sputtering; Cermet thin films; Flow sensors; Ni Al2O3

Indexed keywords

CERMETS; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 33745280908     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.008     Document Type: Article
Times cited : (3)

References (24)
  • 3
    • 33745263397 scopus 로고    scopus 로고
    • E. Hafele, US Patent No. 5202665, 13 April 1993.
  • 8
    • 33745254295 scopus 로고    scopus 로고
    • N.A. Gershenfeld, W.W. Webb, E.T. Swartz, T. Ariz, US Patent No. 4906968, 6 March 1990.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.