Interface creation and stress dynamics in plasma-deposited silicon dioxide films

Applied Physics Letters

Volumn 88, Issue 23, 2006, Pages

  Au, V ^a   Charles, C ^a   Boswell, R W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTROMAGNETIC WAVE REFLECTION; FILM GROWTH; INTERFACES (MATERIALS); PLASMA APPLICATIONS; SILICA; STRESS ANALYSIS;

AMORPHOUS SILICON DIOXIDE; IN SITU LASER REFLECTION; ISLAND COALESCENCE; PLASMA-ASSISTED DEPOSITION;

DIELECTRIC FILMS;

EID: 33745052323     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2210085     Document Type: Article

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