Comparison of stress in single and multiple layer depositions of plasma-deposited amorphous silicon dioxide

Journal of Physics D: Applied Physics

Volumn 39, Issue 1, 2006, Pages 164-171

  Au, V ^a   Charles, C ^a   Boswell, R W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; EVAPORATION; PLASMA APPLICATIONS; STRESS ANALYSIS; THIN FILMS;

ELECTRON BEAM EVAPORATION; REACTIVE EVAPORATION; SINGLE-LAYER FILMS; STRESS-THICKNESS;

SILICA;

EID: 29144433588     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/1/024     Document Type: Article

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