Dependence of the IR reflectance LO absorption bands on the crystalline texture of AlN films

Applied Physics Letters

Volumn 88, Issue 23, 2006, Pages

  Iborra, E ^a   Clement, M ^a   Vergara, L ^a   Sanz Hervas A ^a   Olivares, J ^a   Sangrador, J ^a  

^a UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTROMAGNETIC WAVE REFLECTION; ENERGY ABSORPTION; INFRARED RADIATION; POLYCRYSTALLINE MATERIALS; SPUTTERING; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

INFRARED REFLECTANCE SPECTRA; LONGITUDINAL-OPTICAL (LO) VIBRATIONAL MODE; PIEZOELECTRIC RESPONSE; TEXTURED FILMS;

ALUMINUM NITRIDE;

EID: 33745034459     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2209205     Document Type: Article

References (15)

1. P. Ancey, Proceedings of the Fourth Workshop on MEMS for Millimeterwave Communication, Toulouse, France, 2-4 July 2003 (unpublished).
2. R. Lanz and C. Lambert, Proceedings of the 2005 IEEE Ultrasonics Symposium, Rotterdam, The Netherlands, 18-21 September 2005, edited by, M. P. Yuhas, (Industrial Measurement Systems, Aurora, IL, 2005), p. 210.
3. S. Mishin, B. Sylvia, and D. R. Marx, Proceedings of the 2005 IEEE Ultrasonics Symposium, Rotterdam, The Netherlands, 18-21 September 2005, edited by, M. P. Yuhas, (Industrial Measurement Systems, Aurora, IL, 2005), p. 215.
4. N. Rimmer, R. Jakkaraju, C. Shearer, D. Schafer, M. Ford, and P. Rich, Proceedings of the Fourth International Conference on Microelectronics and Interfaces, Santa Clara, CA, 3-6 March 2003.
5. E. Schmidhammer, H. Heinze, M. Woelky, M. Schmiedgen, G. Henn, R. Braun, and T. Metzger, Proceedings of the 2005 IEEE Ultrasonics Symposium, Rotterdam, The Netherlands, 18-21 September 2005, edited by, M. P. Yuhas, (Industrial Measurement Systems, Aurora, IL, 2005), p. 89.
6. A. Sanz-Hervás, M. Clement, E. Iborra, L. Vergara, J. Olivares, and J. Sangrador, Appl. Phys. Lett. 88, 161915 (2006).
7. T. Prokofyeva, M. Seon, J. Vanbuskirk, M. Holtz, S. A. Nikishin, N. N. Faleev, H. Temkin, and S. Zollner, Phys. Rev. B 63, 125313 (2001).
8. M. Beshkova, Z. Zakhariev, M. V. Abrashev, E. Birch, A. Kakanakova, and R. Yakimov, Vacuum 76, 143 (2004).
9. M. Bickermann, B. M. Epelbaum, P. Heimann, Z. G. Herro, and A. Winnacker, Appl. Phys. Lett. 86, 13190 (2005).
10. L. Bergman, D. Alexson, R. J. Nemanich, M. Dutta, M. A. Stroscio, C. Balkas, and R. F. Davis, MRS Internet J. Nitride Semicond. Res. 4S1, G6.65 (1999).
11. A. Sanz-Hervás, E. Iborra, M. Clement, J. Sangrador, and M. Aguilar, Diamond Relat. Mater. 12, 1186 (2003).
12. M. F. MacMillan, R. P. Devaty, and W. J. Choyke, Appl. Phys. Lett. 62, 750 (1993).
13. M. Clement, L. Vergara, J. Olivares, E. Iborra, J. Sangrador, A. Sanz-Hervás, and C. Zinck, Proceedings of the 2004 IEEE Ultrasonics Symposium, Montreal, Canada, 24-27 August 2004, edited by, M. P. Yuhas, (Industrial Measurement Systems, Aurora, IL, 2004), p. 1367.
14. E. Iborra, M. Clement, J. Sangrador, A. Sanz-Hervás, L. Vergara, and M. Aguilar, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 51, 352 (2004).
15. E. Iborra, L. Vergara, J. Sangrador, M. Clement, A. Sanz-Hervás, and J. Olivares, Proceedings of the 2004 IEEE Ultrasonics Symposium, Montreal, Canada, 24-27 August 2004, edited by, M. P. Yuhas, (Industrial Measurement Systems, Aurora, IL, 2004), p. 1880.