Xenon flash lamp annealing of poly-Si thin films

Journal of the Electrochemical Society

Volumn 153, Issue 7, 2006, Pages

  Terai, Fujio ^a,b   Matunaka, Shigeki ^b   Tauchi, Akihiko ^c   Ichimura, Chikako ^c   Nagatomo, Takao ^a   Homma, Tetsuya ^a  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c Toshiba Lighting and Technology Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CRYSTALLIZATION; ELECTRODES; GLASS; GRAIN SIZE AND SHAPE; SUBSTRATES; XENON;

MELTING POINTS; PEAK VOLTAGE; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; XE FLASH LAMP;

THIN FILMS;

EID: 33744806926     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2200291     Document Type: Article

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