[100]-textured growth of polycrystalline diamond films on alumina substrates by microwave plasma chemical vapor deposition

Materials Letters

Volumn 60, Issue 19, 2006, Pages 2390-2394

  Wang, Linjun ^a   Lu, Jinfang ^b   Su, Qingfeng ^a   Wu, Nanchun ^a   Liu, Jianmin ^a   Shi, Weimin ^a   Xia, Yiben ^a  

^a SHANGHAI UNIVERSITY   (China)

^b TONGJI UNIVERSITY   (China)

Author keywords

Alumina; Diamond film; MPCVD

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MICROWAVE DEVICES; NUCLEATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING DIAMONDS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

DIAMOND FILM; GAS PRESSURE; MPCVD; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33744552844     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.01.009     Document Type: Article

References (22)

1. Hsu J.Y., Wu N.C., and Yu S.C. J. Am. Ceram. Soc. 72 (1989) 1861
2. Fan W.D., Wu H., Jagannadham K., and Goral B.C. Surf. Coat. Technol. 72 (1995) 78
3. Mo Y.W., Xia Y.B., Huang X.Q., and Wang H. Thin Solid Films 305 (1997) 266
4. Mo Y.W., Xia Y.B., and Wu W.H. J. Cryst. Growth 191 (1998) 459
5. Bachman P.K. Diamond and Diamond-like Materials Synthesis (1988), Materials Research Society, Pittsburgh
6. Iijima S., Aikawa Y., and Baba K. Appl. Phys. Lett. 57 (1990) 2646
7. Yugo S., Kanai T., Kimura T., and Muto T. Appl. Phys. Lett. 58 (1991) 1036
8. Singh R.K., Gilbert D.R., and Laveige J. Appl. Phys. Lett. 69 (1996) 2181
9. Zhang Y., Xie L., Zhou Zh., Sun J., and Lee S.-T. J. Cryst. Growth 169 (1996) 722
10. Sumant A.V., Godbole V.P., and Kshirsagar S.T. Mater. Sci. Eng., B 39 (1996) L5
11. Qiao X., Fukunaga O., Shinoda N., and Yui K. Diamond Relat. Mater. 5 (1996) 1096
12. Fang Z.J., Xia Y.B., Wang L.J., Wang Z.M., Zhang W.L., and Fan Y.M. J. Phys., D: Appl. Phys. 35 (2002) L57
13. Wang L.J., Xia Y.B., Shen H.J., Zhang M.L., Yang Y., and Wang L. Semicond. Sci. Technol. 19 (2004) L35
14. Jiang X., Fryda M., and Jia C.L. Diamond Relat. Mater. 9-10 (2000) 1640
15. Kang J., Xiao C.Y., Xiong Y.Y., Wang Y.G., Meng Q.B., Lin Z.D., and Feng K.A. Diamond Relat. Mater. 9-10 (2000) 1691
16. Denning P.A., and Stevenson D.A. Appl. Phys. Lett. 59 (1991) 1562
17. Godbole V.P., Narayan R., Xu Z., Narayan J., and Sanka J. Mater. Sci. Eng., B 58 (1999) 251
18. Delchar T.A. Vacuum Physics and Techniques (1993), Chapman and Hall, New York
19. Zheng H.S. Plasma Process Technology (1990), Tsinghua University Press, Beijing
20. Maeda H., et al. J. Mater. Res. 10 (1995) 3115
21. Andrew L., Yee Y.C., Ong L., Stewart M., and Chang R.P.H. J. Mater. Res. 12 (1997) 1796
22. Nemanich R.J. Annu. Rev. Mater. Sci. 21 (1991) 535