The influence of deposition conditions on the dielectric properties of diamond films

Semiconductor Science and Technology

Volumn 19, Issue 3, 2004, Pages

  Wang, Linjun ^a   Xia, Yiben ^a   Zhang, Minglong ^a   Fang, Zhijun ^a   Shi, Weimin ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION;

ALCOHOLS; ALUMINA; CARBON; CERAMIC MATERIALS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN; INFRARED SPECTROSCOPY; IONS; PERMITTIVITY; SUBSTRATES; THERMAL CONDUCTIVITY OF SOLIDS;

DIAMOND FILMS;

EID: 1642299775     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/19/3/L08     Document Type: Letter

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