Development of flat, smooth (100) faceted diamond thin films using microwave plasma chemical vapor deposition

Journal of Materials Research

Volumn 12, Issue 7, 1997, Pages 1796-1805

  Yee, Andrew L ^a,b   Ong, H C ^a   Stewart, L M ^a   Chang, R P H ^a  

^a Northwestern University   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; FILM GROWTH; MORPHOLOGY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY CRYSTALLOGRAPHY;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0031187773     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0248     Document Type: Article

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