Oxygen plasma etching of carbon nano-structures containing nitrogen

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1314-1318

  Acuna J J S ^a   Figueroa, C A ^a   Maia da Costa, M E H ^a   Paredez, P ^a   Ribeiro, C T M ^b   Alvarez, F ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

Carbon nano structures; Field emission; Oxygen etching

Indexed keywords

CARBON; FIELD EMISSION MICROSCOPES; ION BEAM ASSISTED DEPOSITION; ION BEAMS; NANOSTRUCTURED MATERIALS; NICKEL; NITROGEN; SILICON WAFERS; THERMAL EFFECTS;

CARBON NANOSTRUCTURES; DISORDER AND GRAPHITIC BANDS (D AND G BANDS); FIELD EMISSION; OXYGEN ETCHING;

PLASMA ETCHING;

EID: 33744528007     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.10.027     Document Type: Article

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