Characteristics of boron thin films obtained by TVA technology

Journal of Optoelectronics and Advanced Materials

Volumn 8, Issue 2, 2006, Pages 617-620

  Musa, G ^a,b   Vladoiu, R ^a   Ciupina, V ^a   Lungu, C P ^b   Mustata, I ^b   Pat, S ^c   Akan, T ^c   Ekem, N ^c  

^a OVIDIUS UNIVERSITY   (Romania)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c ESKISEHIR OSMANGAZI UNIVERSITY   (Turkey)

Author keywords

Boron film deposition; Characterization; TVA technology

Indexed keywords

BORON CARBIDE; DEPOSITION;

BORON FILMS; CARBON CRUCIBLES; CATHODIC ARC PLASMA; DEPOSITED FILMS; EVAPORATION PROCESS; HRTEM IMAGES; SPACE GROUPS; SUCCESSIVE DEPOSITIONS;

THIN FILMS;

EID: 33646821054     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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