Thermionic vacuum arc (TVA) - Carbon thin film deposition

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 5, 2005, Pages 2485-2487

  Musa, G ^a   Mustata, I ^a   Ciupina, V ^b   Vladoiu, R ^b   Prodan, G ^b   Lungu, C P ^a   Ehrich, H ^c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b OVIDIUS UNIVERSITY   (Romania)

^c UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Carbon thin film deposition; HRTEM; Thermionic Vacuum Arc

Indexed keywords

AMORPHOUS CARBON; CARBON FILMS; DEPOSITION; ELECTRON DIFFRACTION; FILM PREPARATION; THERMIONIC POWER GENERATION; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON (A-C); CARBON THIN FILMS; COEFFCIENT OF FRICTIONS; HRTEM; SELECTED AREA ELECTRON DIFFRACTION; THERMIONIC VACUUM ARC; THERMIONIC VACUUM ARC METHODS; TRANSMISSION ELECTRON;

THIN FILMS;

EID: 27944456835     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (5)

1. S. Ainsenberg, F. Kimock, Materials Sci. Forum, Vol. 52 & 53, Trans. Tech. Switzerland, 1-40 (1990).
2. J. Robertson, Diamond Relat. Mater. 2, 984 (1993).
3. T. Ishiguro, K. Esaki, Y. Hirishima, Appl. Surf. Science 127-129, 553 (1998).
4. P. Martin, IEEE Trans. Plasma Sci. PS-18, 885 (1990).
5. F. Piazza, D. Grambole, L. Zhou, F. Talke, C. Casiraghi, A. C. Ferrari, J. Robertson, Diamond and Related Materials 13, 1505-1510 (2004).